Equipment Photolithograpy Laser Lithography System (Heidelberg Instruments DWL 66+) Contact Mask Aligner (KARL SUSS MA-6) Contact Mask Aligner (KARL SUSS MJB3) Contact Mask Aligner with BSA (KARL SUSS MJB3) Automatic Coater (Suss MicroTec Delta 80 RC) Automatic Developer (Suss MicroTec Delta 8+) Vacuum Oven with NH3 for reversal image (YES-310TA(E)) Dry Film Laminator (JSE JSL-1200) Flood Exposure Tool (OAI-150) Wet bench for resist coating and bakes Wet benches for resist stripping and cleaning Plasma Asher (YES G-1000) Plasma Asher (Axic HF-8) Chrome mask processing tool Wet benches for resist development Nanopatterning E-Beam Lithography (Raith EBPG 5200) Etching Reactive Ion Etching (RIE) ICP Etcher (Plasma-Therm Shuttleline (Chlorine Chemistry)) ICP Deep RIE (Plasma-Therm Versaline (Fluorine Chemistry)) Wet etching benches (RCA clean, Buffered Oxide etch, Isotropic Silicon etch, Aluminium etch, Si3N4 etch, Anisotropic Silicon etch (KOH), Chromium etch) Material Deposition and Annealing Plasma-Enhanced Chemical Vapor Deposition (PE-CVD) Tube Furnaces (BTI-Bruce RTRI-878) E-beam Evaporator (Evatec BAK-501A) E-beam Evaporator (Airco Temescal BJD 1800) E-beam Evaporator (Airco Temescal FC 1800) E-beam Evaporator (VST TFDS-184) Thermal Evaporator (Vinci PVD-4) Thermal Evaporator (Edwards E306A) Sputter Deposition (AJA International Inc. ATC 2200) Plasma-Assisted Atomic Layer Deposition (Ultratech/Cambridge Nanotech Fiji G2) Molecular Vapor Deposition (AMTS 100E) Rapid Thermal Annealing (Jipelec JetFirst 200HT) Printing Pad Printer (Teca-Print TPX301) Wet benches for ink preparation with stirring plate and mixers Viscometer (Viscotech Myr VR 3000) Characterization and Analysis HR-SEM (Hitachi S-4700) HR-SEM (Hitachi S-4800) Atomic Force Microscope (DI-3000) Atomic Force Microscope (Asylum Research/Oxford Instruments MFP-3D Infinity) Surface Profiler (KLA Tencor P-6) Surface Profiler (KLA Tencor 500) Surface Profiler (KLA Tencor 200) Film thickness measurement (Nanometrics AFT 2100 Nanospec) Ellipsometer (Rudolph AutoEL II) Ellipsometer (Gaertner L117) Ellipsometer Multi-layer measurements wave length 193-2500nm (Woollam VASE) Ellipsometer (Woollam M-2000UI) Film stress measurement (Tencor FLX-2320) C-V Plotter (MDC) FPP-5000 Automatic Resistivity Meter I-V probe station (SPA Agilent 4155C, Keithley 2400 I-V metter) CDs Optical Measurements (Vickers micro-system) Optical Microscope with a camera (Nikon Eclipse L200) Optical Microscope (Nikon Labophot-2) Optical Microscopes with a camera (Olympus BX-60) Optical Microscope (Zeiss Axiotron) Contact Angle Goniometer (Ramé-hart 200) Packaging Wire Bonder (TPT HB16) Dicer (Disco DAD3350)
