Molecular Vapor Deposition (AMTS 100E)

Vendor: Applied Microstructures (AMST), Model: MVD100E

Contact: Guy Ankonina (04-829-5014,

Molecular vapor deposition (MVD) system specializes in depositing different materials (organic and inorganic materials) on different substrates at a low temperature (35°-100°C). The system has three cylinders, each contain a different precursor and one cylinder for DI water working as a catalyst.


  • Precursors: FDTS (anti sticking treatment), TMA (for Al2O3 thin films), DEZ (for ZnO thin films)
  • Working pressure 20mTorr
  • Programmable software
  • O2 plasma source (300W RF 13.56MHz)