Vendor: Applied Microstructures (AMST), Model: MVD100E
Contact: Guy Ankonina (04-829-5014, anguy@technion.ac.il)
Molecular vapor deposition (MVD) system specializes in depositing different materials (organic and inorganic materials) on different substrates at a low temperature (35°-100°C). The system has three cylinders, each contain a different precursor and one cylinder for DI water working as a catalyst.
Specifications:
- Precursors: FDTS (anti sticking treatment), TMA (for Al2O3 thin films), DEZ (for ZnO thin films)
- Working pressure 20mTorr
- Programmable software
- O2 plasma source (300W RF 13.56MHz)