Photolithography Laser Lithography System (Heidelberg Instruments DWL 66+) Contact Mask Aligner (KARL SUSS MA-6) Contact Mask Aligner (KARL SUSS MJB3) Automatic Coater (Suss MicroTec Delta 80 RC) Automatic Developer (Suss MicroTec Delta 8+) Vacuum Oven with NH3 for reversal image (YES-310TA(E)) Dry Film Laminator (JSE JSL-1200) Flood Exposure Tool (OAI-150) Wet bench for resist coating and bakes Wet benches for resist stripping and cleaning Plasma Asher (Axic HF-8) Chrome mask processing tool Wet benches for resist development Laser Lithography System Heidelberg Instruments MLA 150
