Vendor: Nanometrics, Model: AFT 2100 Nanospec
Contact: Tatiana Beker (04-829-3250, tatiana@ee.technion.ac.il)
Dr. Orna Ternyak (04-829-4204, ornater@technion.ac.il)
The AFT 2100 Nanospec is a computerized optical system for thickness measurement of dielectric films with known refractive index. It includes a computer controlled grating monochromator and a photomultiplier tube detector. The Nanospec measures an intensity of the reflected light as a function of the light wavelength, from 360 to 760 nanometers. The measured films should be transparent in this range. Thickness determination is based on the interference phenomenon and a comparison between the reflection from the film and from the reference substrate. This instrument offers programs on eleven specific film types, relative reflectance, and multipurpose thick film capability.
Specifications:
- The range of the measured film thicknesses extends from less than 100Å to 50KÅ, with a reproducibility of ±2% to ±5 %
- Three objective lens: x5, x10, x50 for measurement dot size of 50μm, 25μm and 5μm, respectively
- Film types:
- Oxide on Silicon
- Nitride on Silicon
- Negative Resist on Silicon
- Polysilicon on Oxide
- Negative Resist on Oxide
- Nitride on Oxide
- Thin Oxide on Silicon
- Thin Nitride on Silicon
- Polyimide on Silicon
- Positive Resist on Silicon
- Positive Resist on Oxide