Vendor: Heidelberg Instruments, Model: MLA 150
Contact: Amit Shacham (04-8293894, amitsh@technion.ac.il)
The MLA 150 laser lithography system is a high-resolution pattern generator for low volume mask making and direct writing. It can be used for mask making or direct exposure to basically any flat material coated with photoresist.
Especially suitable for lithography process development for non-standard photoresists and substrates and mask-less lithography.
Specifications:
Equipped with laser diode 375 nm, output power 7.2 w
Expose with digital micromirror device (DMD) as fast as 100 * 100 mm2 area within 9 minutes.
Write Head capable of minimum feature size of 1.0 um
Substrates from 5×5 up to 150 x 150 mm²
Optical or pneumatic auto-focus.
Advanced metrology capabilities for process analysis and verification
Advanced optical alignment capabilities for overlay exposures less than 0.5um 3sigma.
With Gray Scale Exposure the beam intensity can be modulated in 128 levels to expose thick resist with gray scale layouts.
High Aspect Ratio mode reduce NA and increase depth of focus.
The tool has capability of Back side alignment.
Automatic substrate labling for focus/dose matrix.