Vendor: Fairchild Convac
Contact: Dima Peselev (04-8295125, pesel@ee.technion.ac.il)
Automated photomask processing unit for chrome and iron oxide mask after exposure in the laser pattern generator DWL-66. Processing includes development, chrome etching, water rinsing and spin dry. The unit is contained in an exhaust enclosure and operated by SIEMENS COROS OP15 multi program process controller.
Specifications:
- Suitable for masks and silicon wafers up to 150 mm
- Stage speed: 50 ÷ 3000 RPM
- Number of chucks: 5
- Number of canisters: 4
- Processes available:
- Chrome mask up to 150 mm square – photoresist development and Cr etching
- Silicon wafer up to 150 mm round – photoresist development
- Upgradeable for new resists processes